Tasuta kohaletoimetamine tellimustele üle 29 €
  • check 10+ miljonit raamatut
  • check Uued tooted iga päev
  • check Meid usaldab üle 1 miljoni kliendi
  • check Hea hind ja allahindlused
  • check Tarne üle kogu Euroopa

Doping Engineering for Front-End Processing: Volume 1070 -

inglise keel
2012-07-31
46,87 € 78,12 €

-40% koodiga BOOKS

Meie tarnija laos

Saadetis 15-21 tööpäeva jooksul

30-päevane tagastamisõigus

Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate d ... Täielik kirjeldus

Võib-olla meeldib sulle ka

Kirjeldus

Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.

Lisateave

Kirjastaja Cambridge University Press
Väljalaskeaasta 2012
Kaanetüüp Pehme kaanega
EAN 9781107408548
Kirjuta oma arvustus
Te vaatate: Doping Engineering for Front-End Processing: Volume 1070
Teie hinnang:

Goodreads'i arvustused

46,87 € 78,12 €