Predictive Simulation of Semiconductor Processing: Status and Challenges -
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Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth d ... Täielik kirjeldus
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Kirjeldus
Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
Lisateave
| Kirjastaja | Springer Berlin Heidelberg |
|---|---|
| Series | Springer Series in Materials Science |
| Väljalaskeaasta | 2004 |
| Kaanetüüp | Kõvakaaneline |
| EAN | 9783540204817 |